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• W2007249526 abstract "Abstract An extensive characterization study of sputtered YBa 2 Cu 3 O 7- x thin films deposited on single-crystal (001) LaAlO 3 substrates was carried out using electron-microscopy techniques to investigate the effect of the deposition parameters on the microstructure of the films. The research focused mainly on the study of the phases present in the film and the orientation and morphology of the grains. The film microstructure was found to be strongly dependent on the atomic mobility during deposition. Lower deposition temperatures and higher oxygen partial pressures led to a lower mobility of atoms favoring smaller grain sizes, larger a -axis coverage and a higher density of stacking faults. A computer model was developed to simulate the microstructural devlopment in the film. With the use of this model, the nucleation density of a -axis grains was found to range from 10 7 to 8×10 11 nuclei/cm 2 ." @default.
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• W2007249526 date "1994-03-01" @default.
• W2007249526 modified "2023-09-27" @default.
• W2007249526 title "Microstructural dependence of sputtered YBa2Cu3O7-x thin films on deposition parameters" @default.
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• W2007249526 doi "https://doi.org/10.1016/0921-4534(94)90545-2" @default.
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