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- W2007317106 abstract "In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how simulators have been used and are soon to be used in semiconductor manufacturing flows. This review paper will describe the most popular and useful examples today for lithography simulators in a manufacturing environment." @default.
- W2007317106 created "2016-06-24" @default.
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- W2007317106 date "2005-01-27" @default.
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- W2007317106 title "Lithography simulation in semiconductor manufacturing" @default.
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- W2007317106 doi "https://doi.org/10.1117/12.584441" @default.
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