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- W2007397798 abstract "Abstract The annealing effects of reactively evaporated indium oxide films in various ambients at temperatures of up to approximately 350°C are reported. It is concluded that the changes in the electrical parameters of the films are due to the chemisorption or desorption of oxygen atoms from the grain boundaries. From these studies the grain boundary barrier heights are found to be 26 meV and 43 meV for as-deposited and air-annealed films respectively." @default.
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- W2007397798 title "Annealing effects in indium oxide films prepared by reactive evaporation" @default.
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- W2007397798 doi "https://doi.org/10.1016/0040-6090(85)90007-0" @default.
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