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- W2007409864 abstract "Topography of silicon surfaces irradiated by a 2 MeV Si$^+$ ion beam at normal incidence and ion fluences in the range $10^{15}-10^{16}$ ions/cm$^{2}$ has been investigated using scanning tunneling microscopy. At length scales below $sim$~50 nm, surface smoothing is observed; the smoothing is more prominent at smaller length scales. The smoothed surface is self-affine with a scaling exponent $alpha=0.53pm0.02$." @default.
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- W2007409864 title "Nanoscale self-affine surface smoothing by ion bombardment" @default.
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- W2007409864 doi "https://doi.org/10.1103/physrevb.68.033401" @default.
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