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• W2007542637 abstract "Nanotribological characterization of amorphous hydrogenated carbon (a-C:H) films is performed by scanning probe microscopy. The a-C:H films are produced on silicon substrate by electron cyclotron resonance microwave plasma chemical vapor deposition. The influence of substrate bias voltage on nanotribological characteristics is investigated. Scanning probe nanotribological tests, including the nano-friction, nano-wear and nano-scratch, are carried out. Large quantitative variations in friction coefficient and wear depth are found for different substrate biases. Results indicate that higher bias is beneficial to wear and deposition rate, and produces a larger friction coefficient. It also shows that substrate bias plays an important role in the tribological characteristics of a-C:H films." @default.
• W2007542637 created "2016-06-24" @default.
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• W2007542637 date "2002-09-01" @default.
• W2007542637 modified "2023-09-27" @default.
• W2007542637 title "Effects of substrate bias on nanotribologyof a-C:H films deposited by ECR-MPCVD" @default.
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• W2007542637 doi "https://doi.org/10.1016/s0925-9635(02)00136-x" @default.
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