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- W2007605575 abstract "We report measurements of the kinetics of scanned probe oxidation under conditions of high humidity and pulsed bias. For a hydrophobic Si surface the oxidation rate for short pulse times (∼10 ms) is controlled by the density of H2O molecules in the ambient humidity surrounding the tip-sample interface. At longer pulse times (∼0.1 s) liquid H2O bridges this interface and the maximum oxidation rate increases by a factor of ∼104 because of the increased density of H2O molecules. We propose that the rate-limiting step of the oxidation process is the production of O anions from the ambient humidity." @default.
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- W2007605575 title "The kinetics and mechanism of scanned probe oxidation of Si" @default.
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- W2007605575 doi "https://doi.org/10.1063/1.126166" @default.
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