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- W2007652890 abstract "A physical vapour deposition, diffusion barrier coating in the system A1-O-N offers the possibility to reduce the interdiffusion between the layers of MCrA1Y and the Ni-base material. The barrier function depends on the high temperature stabilization of the amorphous structure. While amorphous A1-O undergoes modification at 1100°C from several crystalline substructures up to the ϵ phase, A1-O-N remains in the amorphous structure at 1100°C. This coating acts successfully as a passive diffusion barrier, and was tested up to 400 h at 1100°C in annealing tests and up to 2500 cycles in a thermal fatigue test rig with 1115°C and 200°C as the high and low peak temperatures. The gradient-free transition step achieved in the element analysis of the depth profiles, together with the inspection of the cross-sections, confirm the excellent barrier performance." @default.
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- W2007652890 date "1993-12-01" @default.
- W2007652890 modified "2023-09-23" @default.
- W2007652890 title "Diffusion barrier design against rapid interdiffusion of MCrA1Y and Ni-base material" @default.
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- W2007652890 doi "https://doi.org/10.1016/0257-8972(93)90194-s" @default.
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