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• W2007654816 endingPage "6081" @default.
• W2007654816 startingPage "6077" @default.
• W2007654816 abstract "The thermal conductivity of sputtered a-Si:H thin films for a hydrogen content of 1--20 % and a film thickness of 0.2--1.5 ensuremath{mu}m is determined in the temperature range 80--400 K using an extension of the 3ensuremath{omega} measurement technique. The reliability of the method is demonstrated on 1-ensuremath{mu}m-thick a-${mathrm{SiO}}_{2}$ thermally grown on Si. Scattering of phonons at the interface between the a-Si:H film and the substrate places a simple upper limit on the heat transport by long-wavelength phonons and facilitates the comparison of the experimental data to recent numerical solutions of a Kubo formula using harmonic vibrations." @default.
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• W2007654816 date "1994-09-01" @default.
• W2007654816 modified "2023-10-03" @default.
• W2007654816 title "Thermal conductivity of<i>a</i>-Si:H thin films" @default.
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• W2007654816 doi "https://doi.org/10.1103/physrevb.50.6077" @default.
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