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- W2007755627 abstract "Ion beam deposition is discussed in terms of the ion bombardment effects. Properties of thin films are strongly influenced by ion bombardment during film formation. Fundamental effects of ion bombardment to early stage of the film formation and resultant film properties have been elucidated. Emphasis has been placed on the roles of ionized cluster beams (ICB) on film formation because ICB offers unique capabilities for deposition due to the properties of the clusters." @default.
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- W2007755627 title "Ion beam deposition" @default.
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