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- W2007916862 abstract "The requirements for future ferroelectric non-volatile memories (FRAM) include lower operating voltages, higher densities and tighter design rules. In order to achieve these requirements the key component of the FRAM device, viz., the PbZr x Ti 1 m x O 3 (PZT) thin film capacitor must be scaled dimensionally to obtain reduced film thickness and capacitor area. This paper discusses the innfluence of the Pb deficient surface layer, visible under SEM, on the ferroelectric performance of PZT thin films. Tight control Pb loss during PZT thin film processing is shown to be effective to eliminate Pb deficient surface layers; this gives rise to a dramatically improved ferroelectric performance of thickness scaled PZT thin films that can be applied to the manufacturing of low voltage FRAM products." @default.
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- W2007916862 date "2002-01-01" @default.
- W2007916862 modified "2023-10-12" @default.
- W2007916862 title "The Control of Pb Loss for PZT Based FRAM" @default.
- W2007916862 doi "https://doi.org/10.1080/713718315" @default.
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