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- W2007997940 abstract "Atomic Layer Deposition (ALD) is a promising nanotechnology under rapid development for a wide variety of industrial applications. Wide application of ALD technology in industrial productions can generate significant impact on the environment and human health due to the toxic chemicals involved and process emissions generated from ALD production system. In this paper, we conducted computational analysis on a 10 wafer ALD processing system to study the sustainability performance of ALD technology during its batch size production. The simulation is performed on the ALD of Al <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> O <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</inf> high-k dielectric gate in microelectronics manufacturing based on the Cambridge Nanotech's Savannah S100 system which is capable of processing 10 wafers simultaneously through a 10-wafer cassette sitting in the reactor covered by a dome lid. The sustainability analyses are performed by quantitatively investigating the production productivity, precursor emissions, greenhouse gas emissions, and nano-wastes generated from the ALD Al <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> O <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</inf> processes. The study shows that huge amounts of environmental emissions will be generated, and current ALD nanotechnologies must be significantly improved before its wide implementation in various industrial sectors." @default.
- W2007997940 created "2016-06-24" @default.
- W2007997940 creator A5024601679 @default.
- W2007997940 creator A5069683892 @default.
- W2007997940 date "2010-05-01" @default.
- W2007997940 modified "2023-09-25" @default.
- W2007997940 title "Sustainable scale-up studies of Atomic Layer Deposition for microelectronics manufacturing" @default.
- W2007997940 cites W1494720521 @default.
- W2007997940 cites W1670057639 @default.
- W2007997940 cites W1986633864 @default.
- W2007997940 cites W1995191254 @default.
- W2007997940 cites W2004209068 @default.
- W2007997940 cites W2010716222 @default.
- W2007997940 cites W2014211981 @default.
- W2007997940 cites W2025172217 @default.
- W2007997940 cites W2034324012 @default.
- W2007997940 cites W2054197529 @default.
- W2007997940 cites W2058043739 @default.
- W2007997940 cites W2080783422 @default.
- W2007997940 cites W2091755010 @default.
- W2007997940 cites W2115690687 @default.
- W2007997940 cites W2144390947 @default.
- W2007997940 cites W2158932701 @default.
- W2007997940 cites W2470357878 @default.
- W2007997940 doi "https://doi.org/10.1109/issst.2010.5507682" @default.
- W2007997940 hasPublicationYear "2010" @default.
- W2007997940 type Work @default.
- W2007997940 sameAs 2007997940 @default.
- W2007997940 citedByCount "3" @default.
- W2007997940 countsByYear W20079979402019 @default.
- W2007997940 countsByYear W20079979402023 @default.
- W2007997940 crossrefType "proceedings-article" @default.
- W2007997940 hasAuthorship W2007997940A5024601679 @default.
- W2007997940 hasAuthorship W2007997940A5069683892 @default.
- W2007997940 hasConcept C151730666 @default.
- W2007997940 hasConcept C160671074 @default.
- W2007997940 hasConcept C171250308 @default.
- W2007997940 hasConcept C187937830 @default.
- W2007997940 hasConcept C18903297 @default.
- W2007997940 hasConcept C192562407 @default.
- W2007997940 hasConcept C2779227376 @default.
- W2007997940 hasConcept C2816523 @default.
- W2007997940 hasConcept C41008148 @default.
- W2007997940 hasConcept C64297162 @default.
- W2007997940 hasConcept C66204764 @default.
- W2007997940 hasConcept C69544855 @default.
- W2007997940 hasConcept C86803240 @default.
- W2007997940 hasConceptScore W2007997940C151730666 @default.
- W2007997940 hasConceptScore W2007997940C160671074 @default.
- W2007997940 hasConceptScore W2007997940C171250308 @default.
- W2007997940 hasConceptScore W2007997940C187937830 @default.
- W2007997940 hasConceptScore W2007997940C18903297 @default.
- W2007997940 hasConceptScore W2007997940C192562407 @default.
- W2007997940 hasConceptScore W2007997940C2779227376 @default.
- W2007997940 hasConceptScore W2007997940C2816523 @default.
- W2007997940 hasConceptScore W2007997940C41008148 @default.
- W2007997940 hasConceptScore W2007997940C64297162 @default.
- W2007997940 hasConceptScore W2007997940C66204764 @default.
- W2007997940 hasConceptScore W2007997940C69544855 @default.
- W2007997940 hasConceptScore W2007997940C86803240 @default.
- W2007997940 hasLocation W20079979401 @default.
- W2007997940 hasOpenAccess W2007997940 @default.
- W2007997940 hasPrimaryLocation W20079979401 @default.
- W2007997940 hasRelatedWork W1973644244 @default.
- W2007997940 hasRelatedWork W1998994326 @default.
- W2007997940 hasRelatedWork W2082986214 @default.
- W2007997940 hasRelatedWork W2104186298 @default.
- W2007997940 hasRelatedWork W2139442112 @default.
- W2007997940 hasRelatedWork W2367332455 @default.
- W2007997940 hasRelatedWork W2891055371 @default.
- W2007997940 hasRelatedWork W2910258616 @default.
- W2007997940 hasRelatedWork W2949072884 @default.
- W2007997940 hasRelatedWork W3010468778 @default.
- W2007997940 isParatext "false" @default.
- W2007997940 isRetracted "false" @default.
- W2007997940 magId "2007997940" @default.
- W2007997940 workType "article" @default.