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- W2008643122 abstract "By means of (n, p) or (n, α) spectrometry some concentration distributions of 3He. 6Li, and 10B implanted into metallic and/or semiconducting double-layer structures are measured. The samples are characterised by RBS. In many cases good agreement with theory is achieved. Sometimes, the implanted ions show enhanced mobility during the implantation into the multilayer structures, even if this is not the case for implantation into the homogeneous targets of the same materials. This enhanced mobility is indicated by the additional occurrence of precipitations at the interface and surface, and by changes in the shape of the profiles." @default.
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- W2008643122 date "1986-04-01" @default.
- W2008643122 modified "2023-10-14" @default.
- W2008643122 title "Range profiles of ions in double-layer structures" @default.
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- W2008643122 doi "https://doi.org/10.1016/0168-583x(86)90255-7" @default.
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