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• W2008688095 abstract "Diluted arrays of elliptical antidots have been fabricated by optical lithography, electron beam lithography and plasma etching on amorphous Co74Si26 magnetic films with a well-defined uniaxial anisotropy. The magnetic behavior of two identical antidot arrays but with different hole depth in comparison with film thickness has been studied by transverse magneto-optical Kerr effect. Significant differences appear in the coercivity depending on whether the magnetic film is completely perforated or not, indicating a much more effective domain wall pinning process when the depth of the holes is smaller than the magnetic film thickness." @default.
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• W2008688095 date "2007-09-01" @default.
• W2008688095 modified "2023-09-26" @default.
• W2008688095 title "Depth dependence of Néel wall pinning on amorphous CoxSi1−x films with diluted arrays of elliptical antidots" @default.
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• W2008688095 doi "https://doi.org/10.1016/j.jmmm.2007.02.015" @default.
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