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- W2008701023 abstract "Laser light scattering and real-time spectroscopic ellipsometry have been used as in situ monitors for heteroepitaxial growth of Si1 - xGex and Si layers. The techniques have been used to optimize conditions for growth of smooth, high quality epilayers and the potential indicated for real-time control of morphology, composition, and thickness." @default.
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- W2008701023 date "1995-11-16" @default.
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- W2008701023 title "Real-time monitoring of Si1–xGex heteroepitaxial growth using laser light scattering and spectroscopic ellipsometry" @default.
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- W2008701023 doi "https://doi.org/10.1002/pssa.2211520110" @default.
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