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- W2009003953 abstract "Abstract Boron nitride films were deposited from BF3 and NH3 gases using the multi-source plasma CVD technique. This new technique controls to activate each source gas. Each kind of source gas was introduced separately through the plasma generator. After excitation of each gas, these gases were introduced to the front of the substrate. On the other hand, widely spread sheet-like plasma generated above the substrate by dc arc-plasma gun under magnetic field also excited the gas in front of the substrate, and boron nitride film was deposited on it. Also rf power was applied between the grounded chamber and the substrate electrode during the deposition. We have investigated the effect of substrate self-bias, to accelerate ions toward the growing surface, on the structure of the boron nitride films. Deposited boron nitride films were characterized by infrared (IR) absorption spectroscopy. The results of IR absorption spectroscopy indicated the structure of the deposited boron nitride films became hexagonal at lower substrate bias. As the self-bias increased, the shape of the spectra was changed and the broad absorption band near the position of cubic boron nitride formation appeared." @default.
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- W2009003953 date "1997-01-01" @default.
- W2009003953 modified "2023-09-27" @default.
- W2009003953 title "Preparation of boron nitride films by multi-source plasma CVD method" @default.
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- W2009003953 doi "https://doi.org/10.1016/s0168-583x(96)00388-6" @default.
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