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- W2009135057 abstract "The effects of acid structures and blocking groups in chemically amplified resists on compatibility with bottom anti-reflective coatings (BARCs), were investigated. The resists consisted of tert-butoxy carbonyl (t-BOC) or acetal blocked polyhydroxystyrene with three types of photoacid generators (PAGs) which generate trifluoromethanesulfonic acid (acid 1), 2,4-dimethyl benzensulfonic acid (acid 2) and cyclohexanesulfonic acid (acid 3). Three types of commercially available BARCs, Brewer Science CD9, DUV11 and DUV18 were used for this study. CD9 was decomposed by exposure and generated an acid substance, which induced the necking at the bottom of the resist films. In the case of DUV11, the generated acid from the PAG was neutralized, and footing was observed in t-BOC type resists. Acetal type resists had no footing on DUV11 because the deblocking reaction progressed without post-exposure baking. DUV18 had good compatibility with most of the resist materials because of its neutral acidity. From the viewpoint of resist materials, it was found that the acetal type resists tended to have necking, because the deblocking reaction occurred at lower acid concentration compared with t-BOC type resists. Moreover, the tendency to have a necking profile, in increasing order, was acid 3 > acid 2 > acid 1. This order corresponded with the reverse order of the efficiency of the deblocking reaction. A weak acid might be greatly affected by some substance diffused from a BARC. The acetal type resist with acid 1 had excellent compatibility with various BARCs. However, the resolution capability of the acetal type resist with acid 1 was lower than that of the acetal type resist with acid 3, because the acid diffusion length of acid 1 was larger than that of acid 3. It was concluded that good compatibility of the resist with the BARC is achieved by the high deblocking reaction efficiency and moderate diffusion length of acid in acetal type resists." @default.
- W2009135057 created "2016-06-24" @default.
- W2009135057 creator A5020270828 @default.
- W2009135057 creator A5053036229 @default.
- W2009135057 creator A5068407046 @default.
- W2009135057 creator A5072155458 @default.
- W2009135057 creator A5073974620 @default.
- W2009135057 creator A5086379728 @default.
- W2009135057 date "1998-06-29" @default.
- W2009135057 modified "2023-09-23" @default.
- W2009135057 title "Compatibility of chemically amplified photoresists with bottom antireflective coatings" @default.
- W2009135057 doi "https://doi.org/10.1117/12.312459" @default.
- W2009135057 hasPublicationYear "1998" @default.
- W2009135057 type Work @default.
- W2009135057 sameAs 2009135057 @default.
- W2009135057 citedByCount "1" @default.
- W2009135057 crossrefType "proceedings-article" @default.
- W2009135057 hasAuthorship W2009135057A5020270828 @default.
- W2009135057 hasAuthorship W2009135057A5053036229 @default.
- W2009135057 hasAuthorship W2009135057A5068407046 @default.
- W2009135057 hasAuthorship W2009135057A5072155458 @default.
- W2009135057 hasAuthorship W2009135057A5073974620 @default.
- W2009135057 hasAuthorship W2009135057A5086379728 @default.
- W2009135057 hasConcept C119001679 @default.
- W2009135057 hasConcept C159985019 @default.
- W2009135057 hasConcept C171250308 @default.
- W2009135057 hasConcept C178790620 @default.
- W2009135057 hasConcept C185592680 @default.
- W2009135057 hasConcept C188027245 @default.
- W2009135057 hasConcept C192562407 @default.
- W2009135057 hasConcept C2777731525 @default.
- W2009135057 hasConcept C2778648169 @default.
- W2009135057 hasConcept C2779227376 @default.
- W2009135057 hasConcept C53524968 @default.
- W2009135057 hasConceptScore W2009135057C119001679 @default.
- W2009135057 hasConceptScore W2009135057C159985019 @default.
- W2009135057 hasConceptScore W2009135057C171250308 @default.
- W2009135057 hasConceptScore W2009135057C178790620 @default.
- W2009135057 hasConceptScore W2009135057C185592680 @default.
- W2009135057 hasConceptScore W2009135057C188027245 @default.
- W2009135057 hasConceptScore W2009135057C192562407 @default.
- W2009135057 hasConceptScore W2009135057C2777731525 @default.
- W2009135057 hasConceptScore W2009135057C2778648169 @default.
- W2009135057 hasConceptScore W2009135057C2779227376 @default.
- W2009135057 hasConceptScore W2009135057C53524968 @default.
- W2009135057 hasLocation W20091350571 @default.
- W2009135057 hasOpenAccess W2009135057 @default.
- W2009135057 hasPrimaryLocation W20091350571 @default.
- W2009135057 hasRelatedWork W2004832763 @default.
- W2009135057 hasRelatedWork W2009135057 @default.
- W2009135057 hasRelatedWork W2034744792 @default.
- W2009135057 hasRelatedWork W2061604635 @default.
- W2009135057 hasRelatedWork W2088899554 @default.
- W2009135057 hasRelatedWork W2104056599 @default.
- W2009135057 hasRelatedWork W2128284014 @default.
- W2009135057 hasRelatedWork W2325654079 @default.
- W2009135057 hasRelatedWork W2899084033 @default.
- W2009135057 hasRelatedWork W2952816470 @default.
- W2009135057 isParatext "false" @default.
- W2009135057 isRetracted "false" @default.
- W2009135057 magId "2009135057" @default.
- W2009135057 workType "article" @default.