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- W2009193722 abstract "Preliminary experiments with contact-type pattern laser annealing were made for local polycrystallization of a-Si, local evaporation of a-Si and local formation of Ni-Si alloy. These experiments showed that the mask patterns can be replicated as annealed regions with a resolution of a few microns on substrates. To overcome shortcomings due to the contact type pattern annealing, a projection type reduction pattern laser annealing system is proposed for resistless low temperature pattern forming processes." @default.
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- W2009193722 date "1982-01-01" @default.
- W2009193722 modified "2023-10-18" @default.
- W2009193722 title "Pattern Laser Annealing by a Pulsed Laser" @default.
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- W2009193722 doi "https://doi.org/10.7567/jjaps.21s1.441" @default.
- W2009193722 hasPublicationYear "1982" @default.
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