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- W2009293457 abstract "The hydrogen contents and etch rates have been measured for plasma-deposited silicon nitrides made in nine different commercially available reactors as well as for some low pressure chemical vapor deposited nitrides. The hydrogen contents vary from 4% to 39% (atomic). A correlation is observed between etch rate and hydrogen content, with etch rates varying over three orders of magnitude." @default.
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- W2009293457 date "1982-08-01" @default.
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- W2009293457 title "Hydrogen content of a variety of plasma-deposited silicon nitrides" @default.
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- W2009293457 doi "https://doi.org/10.1063/1.331445" @default.
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