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- W2009322571 abstract "The author's earlier work on computer simulation of density effects in sputtering is extended to higher energies and oblique incidence of bombarding ions. Sputtering of amorphous Ge with an artificially varied density by 0.05–100 keV Ar ions is considered in great detail and the influence of density on the yield, angular and energy distributions of sputtered atoms is analysed. It is shown that at normal incidence the sputtering yield increases with density as Np, where p=0.56, 0.43, 0.28 and 0.24 at E0=0.1, 1, 10 and 100 keV, respectively. At grazing incidence the sputtering yield is a decreasing function of N due to surface scattering of bombarding ions (the negative density effect). This finding lent impetus to a successful search for the density effects in sputtering of different elemental targets at grazing bombardment. Overall, the effects of density on the main sputtering characteristics turn out to be significant, which contrasts with the predictions of a number of analytical theories of sputtering." @default.
- W2009322571 created "2016-06-24" @default.
- W2009322571 creator A5020369377 @default.
- W2009322571 date "2002-02-01" @default.
- W2009322571 modified "2023-09-27" @default.
- W2009322571 title "Density effects in sputtering at normal and oblique ion bombardment" @default.
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- W2009322571 doi "https://doi.org/10.1016/s0168-583x(01)00932-6" @default.
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