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- W2009507605 abstract "By an in-situ surface photo-absorption study of the ALE process and carbon atomic layer doping, an other than the so far proposed carbon incorporation mechanism via formation of a CH2 bridge bond has been found, i.e. carbon incorporation via an exchange reaction between dissociated CH3 radicals from TMG and As atoms of the surface onto which TMG is deposited. We also propose a method for reducing the carbon incorporation by thermal desorption of the CH3 groups." @default.
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- W2009507605 title "Carbon incorporation mechanism in atomic layer epitaxy of GaAs and AlGaAs" @default.
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- W2009507605 doi "https://doi.org/10.1016/0169-4332(94)90229-1" @default.
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