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- W2009509905 abstract "Integration of thin tin oxide film formation into CMOS technology is a fundamental step to realize sensitive smart gas sensor devices. Spray pyrolysis is a deposition technique which has the potential to fulfil this requirement. A model for spray pyrolysis deposition is developed and implemented within a Level Set framework. Two models for the topography modification due to spray pyrolysis deposition are presented, with an electric and a pressure atomizing nozzle. The resulting film growth is modeled as a layer by layer deposition of the individual droplets which reach the wafer surface or as a CVD-like process, depending on whether the droplets form a vapor near the interface or if they deposit a film only after surface collision." @default.
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- W2009509905 date "2014-04-01" @default.
- W2009509905 modified "2023-10-18" @default.
- W2009509905 title "Methods of simulating thin film deposition using spray pyrolysis techniques" @default.
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- W2009509905 doi "https://doi.org/10.1016/j.mee.2013.12.025" @default.
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