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- W2009556664 abstract "In a reverse-biased p-n junction, the current component arising from carrier generation in the depletion layer has been up to now considered proportional to the depletion layer width W. As the junction capacitance varies inversely with W, the current-capacitance product should be constant with the applied voltage whenever the reverse current is essentially a generation current. There is experimental evidence, however, that this is not so. In the present paper it is shown that an important cause of such a discrepancy is the considerable difference existing between the depletion layer width and the width Wi of the region in which the generation function reaches its maximum value. In fact, the generation current is proportional to Wi rather than to W and the current-capacitance product must be expected to vary as the ratio WiW, which is all but constant with the applied voltage. A simple model is proposed for evaluation of the generation current effective width Wi, which has been explicitly computed as a function of the applied reverse voltage and of the doping profile in cases of abrupt and linearly-graded junctions." @default.
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- W2009556664 date "1972-09-01" @default.
- W2009556664 modified "2023-10-13" @default.
- W2009556664 title "A theoretical investigation on the generation current in silicon p-n junctions under reverse bias" @default.
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- W2009556664 doi "https://doi.org/10.1016/0038-1101(72)90143-8" @default.
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