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- W2009574984 abstract "The status of x-ray mask inspection and repair at the IBM Advanced Mask Facility is presented. Defect classification and sources are presented along with some preliminary results from a defect printing study done at the Advanced Lithography Facility." @default.
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- W2009574984 date "1993-03-26" @default.
- W2009574984 modified "2023-10-01" @default.
- W2009574984 title "Status of x-ray mask inspection and repair" @default.
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- W2009574984 doi "https://doi.org/10.1117/12.142140" @default.
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