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- W2009580260 abstract "Rapid atomic layer deposition (RALD) has been applied to prepare various nanolaminates with repeated multilayer structures. The possible reaction pathways for RALD of the Al2O3/SiO2 nanolaminate using trimethylaluminum (TMA) and tris(tert-butoxy)silanol (TBS) are investigated by using density functional theory (DFT) calculations. The introduction of a Lewis-acid catalyst, TMA, can result in the formation of the catalytic site, which accelerates the propagation of the siloxane polymer. The rate-determining step of whole RALD is the elimination of isobutene of the tert-butoxy groups. The Brønsted acid site of [AlO4] can catalyze the elimination of isobutene. At the same time, the interfacial interactions, such as hydrogen bonding interactions between tert-butoxy groups and the surface, further catalyze the elimination of isobutene and accelerate SiO2 RALD reactions. The synergistic catalysis of Lewis/Brønsted acid sites and interfacial interactions may be applied in the RALD fabrication of other silica nanolaminates, such as HfO2/SiO2, ZrO2/SiO2, and TiO2/SiO2, in microelectronics, catalysis, energy storage, and conversion." @default.
- W2009580260 created "2016-06-24" @default.
- W2009580260 creator A5020347295 @default.
- W2009580260 creator A5050913542 @default.
- W2009580260 date "2013-01-01" @default.
- W2009580260 modified "2023-10-18" @default.
- W2009580260 title "Rapid atomic layer deposition of silica nanolaminates: synergistic catalysis of Lewis/Brønsted acid sites and interfacial interactions" @default.
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- W2009580260 doi "https://doi.org/10.1039/c3nr02086j" @default.
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