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• W2009587931 abstract "Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C2H2 and a steady decrease of N2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed." @default.
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• W2009587931 date "1999-11-01" @default.
• W2009587931 modified "2023-09-27" @default.
• W2009587931 title "XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate" @default.
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• W2009587931 doi "https://doi.org/10.1016/s0257-8972(99)00426-0" @default.
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