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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2009654039> ?p ?o ?g. }

• W2009654039 abstract "The scaling of some today's high mobility MOSFETs solutions was discussed. The enhancement (between 10-25% for sub-40nm devices) is often lower than the natural mobility decrease due to high short-channel doping (for bulk) or border S/D effects (on SOI). Further understanding of the short channel scattering effects is necessary to engineer next generation high mobility channels" @default.
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• W2009654039 date "2006-01-01" @default.
• W2009654039 modified "2023-10-16" @default.
• W2009654039 title "High Mobility Nano-Scaled CMOS: Some Opportunities and Challenges" @default.
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• W2009654039 doi "https://doi.org/10.1109/istdm.2006.246513" @default.
• W2009654039 hasPublicationYear "2006" @default.
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