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- W2009708197 abstract "The behaviors of electrons and negative ions in a low-pressure (100 mTorr) capacitively-coupled radio-frequency (13.56 MHz) NF 3 /Ar plasma have been studied at a low-power level (2–10 W) using a laser photodetachment technique combined with a microwave cavity resonance method for determining electron density. The wavelength dependent photodetachment measurement indicated that F - is the predominant negative ion species in the plasma. The negative ion density was higher than the electron density by a factor of ∼50 at a NF 3 mixing ratio r as low as 1% and the negative-ion/electron density ratio further increased with increasing r mainly because of the decrease in the electron density. The overall change in the negative ion density in the studied range of 1%< r <40% was relatively small (a factor of ∼2). For small r (<∼10%), the negative ion density increased with decreasing r ; the change in the electron-attachment and ion-ion recombination rate constants with varying r was investigated to explain the phenomenon." @default.
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- W2009708197 date "1997-07-01" @default.
- W2009708197 modified "2023-09-26" @default.
- W2009708197 title "Behavior of Electrons and Negative Ions in a Capacitively-Coupled Radio-Frequency NF3/Ar Plasma" @default.
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- W2009708197 doi "https://doi.org/10.1143/jjap.36.4651" @default.
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