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- W2009814275 abstract "During the development of optical lithography extensions for 32nm, both binary and attenuated phase shift Reticle Enhancement Technologies (RETs) were evaluated. The mask blank has a very strong influence on the minimum feature size and critical dimension (CD) performance that can be achieved on the finished reticle and can have a significant impact on the ultimate wafer lithographic performance. Development of a suitable high resolution binary mask making process was particularly challenging. Standard chrome on glass (COG) binary blanks with 70 nm thick chrome films were unable to support the required minimum feature size, linearity, and through pitch requirements. Two alternative mask blank configurations were evaluated for use in building high resolution binary masks: a binary (BIN) mask blank based on the standard attenuated PSM blank and an Opaque MoSi on Glass (OMOG) mask blank consisting of a newly- developed opaque MoSi [1]. Data comparing the total process bias, minimum feature size, CD uniformity, linearity, through pitch, etch loading effects, flatness, film stress, cleaning durability and radiation durability performance of the different binary and attenuated PSM mask blanks are reported. The results show that the new OMOG binary blank offers significant mask performance benefits relative to the other binary and attenuated PSM mask blanks. The new OMOG blank was the opaque mask blank candidate most capable of meeting 32nm binary mask fabrication requirements.." @default.
- W2009814275 created "2016-06-24" @default.
- W2009814275 creator A5002701236 @default.
- W2009814275 creator A5004229374 @default.
- W2009814275 creator A5007871378 @default.
- W2009814275 creator A5015330526 @default.
- W2009814275 creator A5019065180 @default.
- W2009814275 creator A5023527392 @default.
- W2009814275 creator A5024395105 @default.
- W2009814275 creator A5025338312 @default.
- W2009814275 creator A5050332336 @default.
- W2009814275 creator A5078797707 @default.
- W2009814275 creator A5089421397 @default.
- W2009814275 date "2008-10-24" @default.
- W2009814275 modified "2023-09-27" @default.
- W2009814275 title "Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication" @default.
- W2009814275 doi "https://doi.org/10.1117/12.801950" @default.
- W2009814275 hasPublicationYear "2008" @default.
- W2009814275 type Work @default.
- W2009814275 sameAs 2009814275 @default.
- W2009814275 citedByCount "12" @default.
- W2009814275 countsByYear W20098142752015 @default.
- W2009814275 countsByYear W20098142752019 @default.
- W2009814275 countsByYear W20098142752021 @default.
- W2009814275 crossrefType "proceedings-article" @default.
- W2009814275 hasAuthorship W2009814275A5002701236 @default.
- W2009814275 hasAuthorship W2009814275A5004229374 @default.
- W2009814275 hasAuthorship W2009814275A5007871378 @default.
- W2009814275 hasAuthorship W2009814275A5015330526 @default.
- W2009814275 hasAuthorship W2009814275A5019065180 @default.
- W2009814275 hasAuthorship W2009814275A5023527392 @default.
- W2009814275 hasAuthorship W2009814275A5024395105 @default.
- W2009814275 hasAuthorship W2009814275A5025338312 @default.
- W2009814275 hasAuthorship W2009814275A5050332336 @default.
- W2009814275 hasAuthorship W2009814275A5078797707 @default.
- W2009814275 hasAuthorship W2009814275A5089421397 @default.
- W2009814275 hasConcept C104304963 @default.
- W2009814275 hasConcept C105487726 @default.
- W2009814275 hasConcept C120665830 @default.
- W2009814275 hasConcept C121332964 @default.
- W2009814275 hasConcept C136525101 @default.
- W2009814275 hasConcept C142724271 @default.
- W2009814275 hasConcept C146617872 @default.
- W2009814275 hasConcept C14737013 @default.
- W2009814275 hasConcept C159985019 @default.
- W2009814275 hasConcept C160671074 @default.
- W2009814275 hasConcept C192562407 @default.
- W2009814275 hasConcept C204223013 @default.
- W2009814275 hasConcept C204787440 @default.
- W2009814275 hasConcept C2778089247 @default.
- W2009814275 hasConcept C2779227376 @default.
- W2009814275 hasConcept C33923547 @default.
- W2009814275 hasConcept C48372109 @default.
- W2009814275 hasConcept C49040817 @default.
- W2009814275 hasConcept C53524968 @default.
- W2009814275 hasConcept C60056205 @default.
- W2009814275 hasConcept C71924100 @default.
- W2009814275 hasConcept C94375191 @default.
- W2009814275 hasConceptScore W2009814275C104304963 @default.
- W2009814275 hasConceptScore W2009814275C105487726 @default.
- W2009814275 hasConceptScore W2009814275C120665830 @default.
- W2009814275 hasConceptScore W2009814275C121332964 @default.
- W2009814275 hasConceptScore W2009814275C136525101 @default.
- W2009814275 hasConceptScore W2009814275C142724271 @default.
- W2009814275 hasConceptScore W2009814275C146617872 @default.
- W2009814275 hasConceptScore W2009814275C14737013 @default.
- W2009814275 hasConceptScore W2009814275C159985019 @default.
- W2009814275 hasConceptScore W2009814275C160671074 @default.
- W2009814275 hasConceptScore W2009814275C192562407 @default.
- W2009814275 hasConceptScore W2009814275C204223013 @default.
- W2009814275 hasConceptScore W2009814275C204787440 @default.
- W2009814275 hasConceptScore W2009814275C2778089247 @default.
- W2009814275 hasConceptScore W2009814275C2779227376 @default.
- W2009814275 hasConceptScore W2009814275C33923547 @default.
- W2009814275 hasConceptScore W2009814275C48372109 @default.
- W2009814275 hasConceptScore W2009814275C49040817 @default.
- W2009814275 hasConceptScore W2009814275C53524968 @default.
- W2009814275 hasConceptScore W2009814275C60056205 @default.
- W2009814275 hasConceptScore W2009814275C71924100 @default.
- W2009814275 hasConceptScore W2009814275C94375191 @default.
- W2009814275 hasLocation W20098142751 @default.
- W2009814275 hasOpenAccess W2009814275 @default.
- W2009814275 hasPrimaryLocation W20098142751 @default.
- W2009814275 hasRelatedWork W1544888428 @default.
- W2009814275 hasRelatedWork W2016008899 @default.
- W2009814275 hasRelatedWork W2023212528 @default.
- W2009814275 hasRelatedWork W2052805415 @default.
- W2009814275 hasRelatedWork W2055475127 @default.
- W2009814275 hasRelatedWork W2057382384 @default.
- W2009814275 hasRelatedWork W2079787243 @default.
- W2009814275 hasRelatedWork W2081221563 @default.
- W2009814275 hasRelatedWork W2084303300 @default.
- W2009814275 hasRelatedWork W2506049589 @default.
- W2009814275 isParatext "false" @default.
- W2009814275 isRetracted "false" @default.
- W2009814275 magId "2009814275" @default.
- W2009814275 workType "article" @default.