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- W2009920976 abstract "Using vicinal Si(001) surfaces with a 4° miscut angle towards the [110] direction as templates, an approach to fabricating well-aligned nanowires of Er silicide is demonstrated. At Er coverage of 0.1–0.3 nm and annealing temperature of 600–700 °C, ordered nanowires are obtained on the surface several hundreds of nanometres in length. STM images and LEED patterns reveal that the nanowires are all oriented along the direction. The size, shape and density of the nanowires depends upon annealing temperature and duration as well as coverage. The experimental evidence also suggests a transition of bulk atomic structures between AlB2 and ThSi2 for Er silicide nanostructures. The alignment of the Er nanowires will make the measurements of their physical properties practicable." @default.
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- W2009920976 date "2004-09-21" @default.
- W2009920976 modified "2023-09-27" @default.
- W2009920976 title "Fabrication of well-aligned Er nanowires on vicinal silicon(001) surfaces" @default.
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- W2009920976 doi "https://doi.org/10.1088/0953-8984/16/39/016" @default.
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