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- W2009936550 abstract "X-ray lithography has been used widely for the fabrication of nano/micro structures. This process was applied to the fabrication of barrier ribs with a high aspect ratio for plasma display panel (PDP). The design of X-ray mask and X-ray exposure process were optimized to fabricate highly precise barrier rib pattern for PDP." @default.
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- W2009936550 date "2009-11-11" @default.
- W2009936550 modified "2023-10-18" @default.
- W2009936550 title "Fabrication of Step-Formed PDP Barrier Ribs with High Aspect Ratio by X-Ray Lithography" @default.
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- W2009936550 doi "https://doi.org/10.1080/15421400903240829" @default.
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