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- W2009942059 abstract "A facility for MeV ion irradiation of large areas (10 × 10 cm2) is described. Irradiation with a variety of ion beams at fluences ranging from 108 to 1015 ions/cm2 can be conducted with less than 5% variation in dose. The system is presently used for charge-carrier lifetime control in semiconductors and for studies of thin film adhesion enhancement." @default.
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- W2009942059 date "1989-03-01" @default.
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- W2009942059 title "An MeV-ion implanter for large area applications" @default.
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- W2009942059 doi "https://doi.org/10.1016/0168-583x(89)90679-4" @default.
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