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- W2010002512 abstract "Characteristics of maskless ion beam assisted etching of GaAs have been investigated. A focused Ga beam was irradiated on GaAs in a chlorine atmosphere. It was observed that this etching technique gives a higher etching rate than physical sputter etching without chlorine gas. The etching rate exhibited a maximum at a gas pressure of about 20 mTorr and decreased above that. By the present technique, 0.3 µm wide, 3 µm deep U-shaped grooves were formed on GaAs surface, while by physical sputter etching the grooves were V-shaped and narrow due to redeposition and/or self focusing effect." @default.
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- W2010002512 date "1984-06-01" @default.
- W2010002512 modified "2023-09-26" @default.
- W2010002512 title "Characteristics of Ion Beam Assisted Etching of GaAs Using Focused Ion Beam: Dependence on Gas Pressure" @default.
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- W2010002512 doi "https://doi.org/10.1143/jjap.23.l400" @default.
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