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• W2010176572 abstract "As a promising simple and cost-effective deposition technique, electrostatic spray assisted vapor deposition (ESAVD) involves the generation and charging of droplets which are then delivered into a heated zone where they undergo the decomposition and/or chemical reactions in the vapor phase. This papers reports the effect of amorphous and polycrystalline substrate on the growth of TiO 2 films. The effect of temperature, the key process parameters on the deposition of TiO 2 films has been studied systematically. The deposition and influence of temperature on the grain growth will be presented. The deposited TiO 2 films were characterized using a combination of XRD, SEM and AFM techniques. Based on the experimental results, a droplet model is used to elucidate the effect of temperature on deposition mechanism." @default.
• W2010176572 created "2016-06-24" @default.
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• W2010176572 date "2004-03-01" @default.
• W2010176572 modified "2023-10-18" @default.
• W2010176572 title "Deposition mechanism and structural characterization of TiO2 films produced using ESAVD method" @default.
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• W2010176572 doi "https://doi.org/10.1016/j.surfcoat.2003.10.023" @default.
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