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• W2010236460 abstract "The TiOx thin films were prepared by electron beam evaporation using TiO as the starting material. The effect of the annealing temperature on the optical and electrical properties was investigated. The spectra of X-ray photoelectron spectroscopy reveal that Ti in the films mainly exist in the forms of Ti2+ and Ti3+ below 400 °C 24 h annealing. The charge transfer between different titanium ion contribute greatly to the color, absorption, and electrical resistance of the films." @default.
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• W2010236460 date "2007-05-01" @default.
• W2010236460 modified "2023-10-06" @default.
• W2010236460 title "Optical and electrical properties of TiOx thin films deposited by electron beam evaporation" @default.
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• W2010236460 doi "https://doi.org/10.1016/j.vacuum.2006.11.002" @default.
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