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- W2010470266 abstract "We demonstrate a compact interferometric lithography nanopatterning tool based on an amplitude division interferometer (ADI) and a 46.9 nm wavelength desktop size capillary discharge laser. The system is designed to print arrays of lines, holes, and dots with sizes below 100 nm on high resolution photoresists for the fabrication of arrays of nanostructures with physical and biological applications. The future combination of this ADI with high repetition rate tabletop lasers operating at shorter wavelengths should allow the printing of arrays of sub-10 nm size features with a tabletop setup." @default.
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- W2010470266 date "2008-05-21" @default.
- W2010470266 modified "2023-09-26" @default.
- W2010470266 title "Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser" @default.
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- W2010470266 doi "https://doi.org/10.1364/josab.25.00b104" @default.
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