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- W2010474366 abstract "Ti 4 + ion-doped BiFeO3 thin films were prepared by sol-gel spin-coating technique on (111)Pt∕Ti∕SiO2∕Si substrates. X-ray diffraction and scanning electron microscope revealed the single phase, and good surface and cross-section morphologies of the films, respectively. Leakage current density measurement indicated that the quality of the BiFeO3 films was improved by Ti4+ doping. By introducing a small amount of Ti ions into the sol-gel solution-processed BiFeO3 films, large enhancement in both remnant and saturation polarizations of the doped-BiFeO3 films in comparisons with the undoped BiFeO3 films was observed, due to the reduced leakage current, stabilization of the ferroelectric distortion by Ti4+, and more homogenous microstructure." @default.
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- W2010474366 date "2006-07-31" @default.
- W2010474366 modified "2023-10-07" @default.
- W2010474366 title "Enhanced ferroelectricity in Ti-doped multiferroic BiFeO3 thin films" @default.
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- W2010474366 doi "https://doi.org/10.1063/1.2222242" @default.
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