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- W2010536079 abstract "The atomic structure of Si(111) √3×√3-In was investigated by low energy ion scattering spectroscopy with 1 keV He + ions. Azimuthal angular distributions of scattered ions suggest that the In atoms are located in the three-fold sites on top of the second layer Si atoms. Comparing the experimental distribution as a function of the incident angle with the calculation using the Thomas-Fermi-Molière potential taking of the thermal vibrations, the Debye temperature of the surface In atoms and the bond length between the In atom and the first layer Si atom were estimated." @default.
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- W2010536079 date "1989-10-01" @default.
- W2010536079 modified "2023-09-30" @default.
- W2010536079 title "Structural Investigation of Si(111) √3×√3-In by Low-Energy Ion-Scattering Spectroscopy" @default.
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- W2010536079 doi "https://doi.org/10.1143/jjap.28.1742" @default.
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