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- W2010598678 abstract "We have investigated the electrical performance of amorphous indium–gallium–zinc oxide (α-IGZO) thin-film transistors with various channel thicknesses. It is observed that when the α-IGZO thickness increases, the threshold voltage decreases as reported at other researches. The intrinsic field-effect mobility as high as 11.1 cm2/Vs and sub threshold slope as low as ∼0.2 V/decade are independent on the thickness of α-IGZO channel, which indicate the excellent interface between α-IGZO and atomic layer deposited Al2O3 dielectric even for the case with α-IGZO thickness as thin as 10 nm. However, the source and drain series resistances increased with increasing of α-IGZO channel thickness, which results in the apparent field-effect mobility decreasing. The threshold voltage shift (ΔVth) under negative bias stress (NBS) and negative bias illumination stress (NBIS) were investigated, also. The hump-effect in the sub threshold region under NBS and threshold voltage shift to negative position under NBIS were enhanced with decreasing of α-IGZO channel thickness, owing to the enhancement of vertical electrical field in channel." @default.
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- W2010598678 date "2014-07-01" @default.
- W2010598678 modified "2023-10-03" @default.
- W2010598678 title "Effect of channel thickness on electrical performance of amorphous IGZO thin-film transistor with atomic layer deposited alumina oxide dielectric" @default.
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- W2010598678 doi "https://doi.org/10.1016/j.cap.2014.04.011" @default.
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