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- W2010806912 abstract "Abstract The electroless deposition processes of copper, silver and gold using cobalt(II) complexes with organic amines as reducing agents were studied. The autocatalytic copper deposition was observed in propylenediamine (1,2-diaminopropane) solutions at pH over 5, the metal deposition rate reaching 4 μm/h at 20°C and 5 μm/h at 50°C. For electroless silver plating solutions, the possibility to replace the largest part of ammonia in the earlier developed solution by glycine was demonstrated, and the new silver plating solution containing trimethylenediamine (TMDA) was developed (plating rate up to 3 μm/h). The electroless gold deposition with film formation rate up to 1 μm/h was observed in TMDA solutions. The coatings obtained are compact and bright, and it is possible to regenerate the reducing agent – cobalt(II) complex." @default.
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- W2010806912 date "2002-10-01" @default.
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- W2010806912 title "Obtaining of IB group metal films by novel electroless deposition method" @default.
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- W2010806912 doi "https://doi.org/10.1016/s1293-2558(02)00007-9" @default.
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