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- W2011279084 abstract "Several major experimental and theoretical findings made in the last few years on the mechanisms of secondary ion emission are summarized. There is a strong indication that the phenomena can be divided into two categories: Ion emission from the surfaces of metals and semiconductors tends to have a strong correlation with the work function and can be described quite well with an electron tunneling model. Ion emission from systems which show large chemical enhancement has only a weak correlation with global surface properties like the work function or the bandgap. Instead it seems to be related more to local chemical bonds and coordination numbers. A localized bond breaking picture may be more appropriate in these circumstances." @default.
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- W2011279084 date "1986-04-01" @default.
- W2011279084 modified "2023-09-28" @default.
- W2011279084 title "Mechanisms of atomic ion emission during sputtering" @default.
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- W2011279084 doi "https://doi.org/10.1016/0168-583x(86)90135-7" @default.
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