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• W2011341252 abstract "An ultra high vacuum-scanning electron microscope (UHV-SEM), equipped with micro-Auger electron spectroscopy, RHEED, and a deposition source has been used to study submpnolayers of Ag on Si(111), Si(100) and W(110) surfaces. A new SEM technique has been developed to visualize these submonolayers directly by applying a high negative bias (−500 V) to the sample. The dependence of the visibility on bias voltage, layer thickness and angle of incidence of the electron beam has been studied. The sensitivity was found to be better than 0.1 ML in the case of Ag on Si surfaces. Some applications to surface diffusion have been made and preliminary results for Ag on Si(111) are noted. Contrast at the 1 ML level can be > 10% in certain cases. The understanding of this contrast in terms of work function and ionization energy (band-bending) changes is discussed." @default.
• W2011341252 created "2016-06-24" @default.
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• W2011341252 date "1985-02-01" @default.
• W2011341252 modified "2023-09-29" @default.
• W2011341252 title "Visualization of submonolayers and surface topography by biassed secondary electron imaging: Application to Ag layers on Si and W surfaces" @default.
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• W2011341252 doi "https://doi.org/10.1016/0039-6028(85)90657-0" @default.
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