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- W2011457568 abstract "Huang diffuse scattering was used to study the annealing behaviour of vacancies and interstitials produced by different types of hydrogen implantation. The results show the presence of point defect clusters with an anisotropic strain field." @default.
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- W2011457568 title "Study of point defect clusters in hydrogen implanted silicon by X-ray diffuse scattering" @default.
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