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• W2011471527 abstract "Lateral strain modulations in a Si substrate arising from laterally patterned periodic SiO2 stripes were investigated by x-ray grazing incidence diffraction. In this diffraction geometry a depth dependent in-plane strain analysis was performed. Using finite element calculations the displacement field in the non-patterned Si substrate was calculated, which served as an input for the simulation of the diffracted intensities based on the distorted-wave Born approximation. By varying the lattice mismatch between the SiO2 stripes and the Si substrate, a good agreement between simulations and experimental diffraction data could be achieved." @default.
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• W2011471527 date "2001-05-03" @default.
• W2011471527 modified "2023-09-23" @default.
• W2011471527 title "GID study of strains in Si due to patterned SiO2" @default.
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• W2011471527 doi "https://doi.org/10.1088/0022-3727/34/10a/341" @default.
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