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- W2011546415 abstract "The band gap of the base of Si1−xGex strained-layer base heterojunction bipolar transistors has been investigated using minority-carrier transport measurements. We have found a band-gap reduction of 131 meV for a base of Si0.82Ge0.18, which is in reasonable agreement with theoretical calculations. Our measurements for a base of Si0.85Ge0.15 show a band-gap reduction less than predicted, suggesting a reduction of strain in the structure." @default.
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- W2011546415 date "1989-06-26" @default.
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- W2011546415 title "Band‐gap shifts in silicon‐germanium heterojunction bipolar transistors" @default.
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- W2011546415 doi "https://doi.org/10.1063/1.101003" @default.
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