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• W2011641566 abstract "A plasma-enhanced chemical deposition system with hydrogen radical-injection (RI) is proposed for the fabrication of hydrogenated microcrystalline silicon (μc-Si:H) thin films. The plasma parameters and resultant growth characteristics obtained with the RI-capacitively coupled plasma (RI-CCP) system excited with 60 MHz power were compared with those obtained using a conventional CCP (C-CCP) system. The absolute density of hydrogen (H) radicals was measured by vacuum ultraviolet laser absorption spectroscopy (VUVLAS) to evaluate the effect of RI for controlling the H radical density. A higher density of H radicals was achieved with RI-CCP than with C-CCP by H RI. The crystallinity factor, preferential orientation, defect density, microstructure, and post-deposition oxidation of Si thin films deposited using C-CCP and RI-CCP were investigated. Crystallinity factor of 0.6 was realized with high deposition rate of about 2 nm/s even under a low plasma density using RI-CCP. The defect density of μc-Si:H thin films prepared using RI-CCP was lower than that in thin films prepared using C-CCP. In addition, post-deposition oxidation of the films with RI-CCP was lower than that with C-CCP. The high performance of RI-CCP for the fabrication of μc-Si:H thin films for solar cell devices is also demonstrated." @default.
• W2011641566 created "2016-06-24" @default.
• W2011641566 creator A5006676797 @default.
• W2011641566 creator A5009572620 @default.
• W2011641566 creator A5025289858 @default.
• W2011641566 creator A5031756864 @default.
• W2011641566 creator A5033650757 @default.
• W2011641566 creator A5042472026 @default.
• W2011641566 creator A5061563484 @default.
• W2011641566 creator A5082735601 @default.
• W2011641566 creator A5091853924 @default.
• W2011641566 date "2013-01-18" @default.
• W2011641566 modified "2023-09-27" @default.
• W2011641566 title "Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells" @default.
• W2011641566 cites W1669196377 @default.
• W2011641566 cites W1965097855 @default.
• W2011641566 cites W1969175538 @default.
• W2011641566 cites W1975299853 @default.
• W2011641566 cites W1976124014 @default.
• W2011641566 cites W1976757339 @default.
• W2011641566 cites W1979266857 @default.
• W2011641566 cites W1989575025 @default.
• W2011641566 cites W1998183753 @default.
• W2011641566 cites W1998618942 @default.
• W2011641566 cites W2001778576 @default.
• W2011641566 cites W2011413488 @default.
• W2011641566 cites W2012181842 @default.
• W2011641566 cites W2013396114 @default.
• W2011641566 cites W2042788897 @default.
• W2011641566 cites W2045994131 @default.
• W2011641566 cites W2046533733 @default.
• W2011641566 cites W2054517590 @default.
• W2011641566 cites W2054881253 @default.
• W2011641566 cites W2059403731 @default.
• W2011641566 cites W2065321381 @default.
• W2011641566 cites W2065360227 @default.
• W2011641566 cites W2071110170 @default.
• W2011641566 cites W2074357801 @default.
• W2011641566 cites W2077926126 @default.
• W2011641566 cites W2080163975 @default.
• W2011641566 cites W2082536881 @default.
• W2011641566 cites W2086389870 @default.
• W2011641566 cites W2116954066 @default.
• W2011641566 cites W2137072811 @default.
• W2011641566 cites W243455229 @default.
• W2011641566 cites W4240905921 @default.
• W2011641566 doi "https://doi.org/10.1063/1.4778608" @default.
• W2011641566 hasPublicationYear "2013" @default.
• W2011641566 type Work @default.
• W2011641566 sameAs 2011641566 @default.
• W2011641566 citedByCount "9" @default.
• W2011641566 countsByYear W20116415662016 @default.
• W2011641566 countsByYear W20116415662017 @default.
• W2011641566 countsByYear W20116415662019 @default.
• W2011641566 countsByYear W20116415662020 @default.
• W2011641566 countsByYear W20116415662022 @default.
• W2011641566 countsByYear W20116415662023 @default.
• W2011641566 crossrefType "journal-article" @default.
• W2011641566 hasAuthorship W2011641566A5006676797 @default.
• W2011641566 hasAuthorship W2011641566A5009572620 @default.
• W2011641566 hasAuthorship W2011641566A5025289858 @default.
• W2011641566 hasAuthorship W2011641566A5031756864 @default.
• W2011641566 hasAuthorship W2011641566A5033650757 @default.
• W2011641566 hasAuthorship W2011641566A5042472026 @default.
• W2011641566 hasAuthorship W2011641566A5061563484 @default.
• W2011641566 hasAuthorship W2011641566A5082735601 @default.
• W2011641566 hasAuthorship W2011641566A5091853924 @default.
• W2011641566 hasConcept C113196181 @default.
• W2011641566 hasConcept C139066938 @default.
• W2011641566 hasConcept C151730666 @default.
• W2011641566 hasConcept C159985019 @default.
• W2011641566 hasConcept C171250308 @default.
• W2011641566 hasConcept C178790620 @default.
• W2011641566 hasConcept C185592680 @default.
• W2011641566 hasConcept C19067145 @default.
• W2011641566 hasConcept C192562407 @default.
• W2011641566 hasConcept C201370411 @default.
• W2011641566 hasConcept C2816523 @default.
• W2011641566 hasConcept C46275449 @default.
• W2011641566 hasConcept C49040817 @default.
• W2011641566 hasConcept C512968161 @default.
• W2011641566 hasConcept C544956773 @default.
• W2011641566 hasConcept C64297162 @default.
• W2011641566 hasConcept C8010536 @default.
• W2011641566 hasConcept C86803240 @default.
• W2011641566 hasConceptScore W2011641566C113196181 @default.
• W2011641566 hasConceptScore W2011641566C139066938 @default.
• W2011641566 hasConceptScore W2011641566C151730666 @default.
• W2011641566 hasConceptScore W2011641566C159985019 @default.
• W2011641566 hasConceptScore W2011641566C171250308 @default.
• W2011641566 hasConceptScore W2011641566C178790620 @default.
• W2011641566 hasConceptScore W2011641566C185592680 @default.
• W2011641566 hasConceptScore W2011641566C19067145 @default.
• W2011641566 hasConceptScore W2011641566C192562407 @default.
• W2011641566 hasConceptScore W2011641566C201370411 @default.
• W2011641566 hasConceptScore W2011641566C2816523 @default.
• W2011641566 hasConceptScore W2011641566C46275449 @default.
• W2011641566 hasConceptScore W2011641566C49040817 @default.
• W2011641566 hasConceptScore W2011641566C512968161 @default.
• W2011641566 hasConceptScore W2011641566C544956773 @default.

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