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• W2011677790 abstract "A new series of anionic photoacid generators (PAGs) and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to that of PAG blend polymers. PAG incorporated into the polymer main chain showed improved resolution when compared with the PAG blend polymers. This was demonstrated by extreme ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm (1 : 1), 35 nm (1 : 2), 30 nm (1 : 3) and 20 nm (1 : 4) Line/Space as well as the 50 nm (1 : 1) elbow pattern." @default.
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• W2011677790 date "2007-01-01" @default.
• W2011677790 modified "2023-09-27" @default.
• W2011677790 title "Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography" @default.
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• W2011677790 doi "https://doi.org/10.1039/b617133h" @default.
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