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- W2011712401 abstract "Abstract We have investigated homoepitaxy on H terminated unreconstructed Si(111) at low temperatures. Epitaxy on the (1 × 1) surface requires growth temperatures about 80°C higher than on the bare surface to achieve similar crystal quality. Even at higher temperatures (300°C to 400°C), where excellent growth is expected, we observe a degradation in the surface ordering on the H terminated surface, not observed for growth on the bare surface." @default.
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- W2011712401 date "1995-08-01" @default.
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- W2011712401 title "Medium energy ion scattering investigation of homoepitaxy on H terminated Si(111)" @default.
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- W2011712401 doi "https://doi.org/10.1016/0039-6028(95)80035-2" @default.
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