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- W2011785357 abstract "A plasma-based r.f. method for low energy charge-compensated sputtering of dielectric targets is described. In this method a capacitive r.f. circuit containing the insulating target and a counterelectrode is superimposed on a low pressure plasma which is independently excited, e.g. by electron cyclotron wave resonance. The bombarding ion energy can be varied from 20 up to 200 eV with an energy-independent width of the ion energy distribution of only 5 eV for sufficiently high operation frequencies. The developed method has been successfully applied for sputter removal of leached surface layers on glass samples by charge-compensated bombardment with 100 eV Ar+ ions." @default.
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- W2011785357 date "1993-10-01" @default.
- W2011785357 modified "2023-10-16" @default.
- W2011785357 title "A plasma-based technique for controlled low energy ion bombardment of dielectric surfaces" @default.
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- W2011785357 doi "https://doi.org/10.1016/0257-8972(93)90090-b" @default.
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