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• W2011796102 abstract "The combined effects of the variation of hydrogen pressure (40–400 mTorr) and exciting frequency (13.56–50 MHz) on the electron energy probability function (EEPF) and other plasma parameters in capacitively coupled hydrogen H2 discharge at fixed discharge voltage were investigated using rf-compensated Langmuir probe. At a fixed exciting frequency of 13.56 MHz, the EEPF evolved from Maxwellian-like distribution to a bi-Maxwellian distribution when the H2 pressure increased, possibly due to efficient vibrational excitation. The electron density largely increased to a peak value and then decreased with the increase of H2 pressure. Meanwhile, the electron temperature and plasma potential significantly decrease and reaching a minimum at 120 mTorr beyond, which saturated or slightly increases. On the other hand, the dissipated power and electron density markedly increased with increasing the exciting frequency at fixed H2 pressure and voltage. The electron temperatures negligibly dependent on the driving frequency. The EEPFs at low pressure 60 mTorr resemble Maxwellian-like distribution and evolve into a bi-Maxwellian type as frequency increased, due to a collisonless (stochastic) sheath-heating in the very high frequency regime, while the EEPF at hydrogen pressure ≥120 mTorr retained a bi-Maxwellian-type distribution irrespective of the driving frequency. Such evolution of the EEPFs shape with the driving frequency and hydrogen pressure has been discussed on the basis of electron diffusion processes and low threshold-energy inelastic collision processes taking place in the discharge. The ratio of stochastic power to bulk power heating ratio is dependent on the hydrogen pressure while it is independent on the driving frequency." @default.
• W2011796102 created "2016-06-24" @default.
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• W2011796102 date "2013-02-01" @default.
• W2011796102 modified "2023-10-18" @default.
• W2011796102 title "Combined effects of gas pressure and exciting frequency on electron energy distribution functions in hydrogen capacitively coupled plasmas" @default.
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• W2011796102 doi "https://doi.org/10.1063/1.4789611" @default.
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