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• W2012167558 abstract "High rate deposition of CrNx films with control of microstructure was carried out by magnetron sputtering. For these purposes, the deposition processes parameters were varied: N2 flow rate and especially substrate bias voltage, duty cycle and frequency using a pulsed DC power supply. The microstructure was analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM), and mechanical properties were evaluated by a microhardness test and adhesion test. The maximum deposition rate for CrNx compound films could be reached to nearly 90% compared with that for pure Cr coating due to the increase of ionization efficiency caused by a negative-pulsed DC bias. As N2 flow rate is increased, the microstructure of CrNx films was changed from Cr+Cr2N to CrN. Also, a phase transformation occurred between Cr2N+CrN multi-phase and CrN mono-phase by control of a negative DC and/or pulsed DC bias voltage, duty cycle and frequency. Microhardness for CrNx films were measured to be up to 1600 kg/mm2 and the maximum hardness value of 2250 kg/mm2 was obtained for CrNx film deposited with a N2 flow rate of 20 sccm at a negative DC bias of −100 V." @default.
• W2012167558 created "2016-06-24" @default.
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• W2012167558 date "2000-09-01" @default.
• W2012167558 modified "2023-09-25" @default.
• W2012167558 title "A study on the high rate deposition of CrNx films with controlled microstructure by magnetron sputtering" @default.
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• W2012167558 doi "https://doi.org/10.1016/s0257-8972(00)00813-6" @default.
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